DWE SERIES – Display Wet-Chemical Etching

Etching machines of Manz DWE Series achieve a very good etching uniformity and stability on substrates. Applied by spray nozzles, acids remove parts of metal or ITO films from glass substrates.


Swinging nozzles and oscillation of the substrates ensure a uniform etching result. In order to achieve the needed metal line or ITO pixel definition a DI water rinse and aqua knifes wash all the acids away and stop the etching process.

You can individually configure and scale the various modules for work steps and handling tasks. The standard model of DWE Series comprises loading and unloading unit, conveyor, lift and a process station. The machine can be customized for different processes:

  • Touch/Cover Glass (DWE 100 Series, including roll-to-roll solutions)
  • A-Si TFT (DWE 200 Series, including roll-to-roll solutions)
  • LTPS (DWE 300 Series, including roll-to-roll solutions)
  • OLED (DWE 400 Series)
  • Fan-out (DWE 500 Series)


  • A single machine applying for various film materials effectively reduces cost of ownership
  • No Mura, foam, water or roller marks, on the substrates after the process
  • CMS integration for control of concentration and saving of chemicals
  • Excellent isolation effect and air pumping field control effectively prevent leakage of chemical gas and liquids and increase production safety
  • Integrated EPD function for process control


Market segmentation Touch Panel/ Cover Glasses/ a-Si TFT/LTPS/Fan Out

Production uptime

≥ 95 %

Substrate thickness

Above G8.5: 0.4 mm ~ 0.7 mm
Below G6: 0.2 mm ~ 0.7 mm

Transportation pass

± 0.5 mm

CD uniformity

3 σ ≤ 0.7 µm


Etching rate deviation < 10 %

Breakage rate

< 1/10,000


Mitsubishi PLC with color touchscreen

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