PWE Series – PCB Wet-Chemical R2R Etching

Roll-to-roll (R2R) etching equipment of the PWE Series comprises copper etching, rinsing and drying processes in the production of FPCs. All machines of the PWE Series are matched with developing and stripping processes such as film or tin stripping.


  • Particularly suitable for fine-line circuits due to etching factor of ≥ 3.5
  • Due to current collecting device, improved water-pool effect and high etching uniformity of up to 95 %
  • Robotic loader and unloader ensure quick and accurate operation
  • Single-track or double-track conveyor can be selected according to production capacity and process requirements


  • Modularized design: tension or dancer rollers can be selected according to the process requirements to avoid deforming
  • Robust body structure to maintain parallel position of rollers during long term operation
  • Superior Edge Position Control (EPC) to ensure even and straight rolling
  • No pre-etching and compensating etching processes needed, thus flow process is shortened and production costs are reduced effectively
  • Sloped-bottom and small-volume tanks for rinsing processes to improve tank turnover rate by 50 %


Specifications of substrates:

Panel width:

250 – 600 mm (can be customized for different sizes)

Panel thickness:

12.5 μm – 25 μm or thicker.

Dia. of through hole:

min. 0.1 mm A/R 10:1

Dia. of blind hole:

min. 0.075 mm A/R 1:1

Etching capability:

30/30 μm for 12 μm Cu
40/40 μm for 18 μm Cu

R2R performance:

Mean repair time (MTTR):

4 h

Normal operating time (uptime):

≥ 95 %

EPC permissible edge alignment:

± 0.5 mm

Low-tension control:

5 N – 30 N


Additional data available on request.

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