Photoresist coating is a critical step in the lithographic process within touch panel and display production. Evenness and amount of photoresist used are fundamental to overall yield and production costs.
The slit coating technology of Manz controls evenness to within 3 % and reduces the amount of photoresist used, thus lowering production costs and increasing yield.
Since the display industry has been transferring technology from glass substrates to flexible substrates, we have developed a high-precision roll-to-roll (R2R) coating platform additionally to our sheet-by-sheet coating platform.
Excellent control of film evenness is only one of the advantages of our coating equipment. Our design capabilities enable modification and redesign of existing coating blades to accommodate different liquids. The unique auto-driving and responsive syringe pump design achieves 99.9 % reproduction of precision with coating pressure stability maintained under 0.15 kpa.
We can provide different coating solutions in accordance with substrate specifications. An inline stage system is suitable for substrates of Generation 4.5 (730 mm x 920 mm) and smaller since robotic arms are not needed in the upstream or downstream sections of the production process. Synchronized substrate loading and unloading shorten tact time and increase throughput.
The gantry system is suitable for production of Generation 4.5 up to 8.5 (2,200 mm x 2,500 mm) substrates as it synchronizes substrate loading and unloading with the Manz Exchange Fork System to shorten tact time.
Our R2R slit coater processes flexible materials such as PET, PI, COP, metal foils or flexible glass with a width from 500 mm up to 1,200 mm.